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IMAGING / 3D CMOS FPD

3D CMOS FPDIn development

A 3D CMOS X-ray image sensor that optimizes the photodetector and signal-processing circuitry as separate chips in separate processes, then stacks them. Per-pixel walls confine scintillator light, preserving contrast down to fine structures.

PHOTO

Product Photos

*Development unit mounted on an evaluation board.

SPECIFICATIONS

Specifications

Name3D CMOS FPD
Detection methodScintillator + 3D stacked CMOS (indirect conversion)
Sensor thickness300μm
Active imaging areaApprox. 205 x 205 mm
Pixel count2048 x 2048 pixels
Pixel pitch100μm
Resolution4.23 lp/mm (MTF 50%)
Maximum frame rate150 fps
Bit depth14 bit
Minimum detectable energy—
Operating modesLow-gain mode / High-gain mode
Shutter typeGlobal shutter
InterfaceCamera Link x 2 / GbE (GbE has operating speed limitations)
Power supply24V DC
External dimensions—
Weight—
Operating temperature40℃ or below (non-condensing)
TECHNOLOGY

Technical Details

STRUCTURE

Optimized separately, then stacked

The photodetector (photodiode) and the signal-processing ASIC call for entirely different optimal materials and processes. Each is fabricated in a dedicated process, and the two are joined into a single sensor by flip-chip bonding. Wiring is routed through an RDL (redistribution layer), and no TSVs are used for electrical connections. The scintillator is chosen to suit the application: GOS (industrial and non-destructive testing) or CsI (medical).

ISOLATION

Suppressing optical crosstalk with a walled structure

A hole array etched into the back of the substrate is filled with scintillator, forming walls around each pixel. Combined with a peripheral ring structure, this virtually eliminates light leaking into neighboring pixels.

RESOLUTION

Contrast maintained at high frequencies

Because the walls limit the spread of light, contrast holds up even at the high spatial frequencies that correspond to fine structures. Measured under RQA5 conditions, the spatial frequency at which MTF reaches 50% is 4.23 lp/mm, far exceeding conventional TFT (1.60 lp/mm) and CMOS (1.24 lp/mm) designs in which the scintillator is applied as a uniform sheet.

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